ASMC 2019 - Session 10

Wednesday, May 8

Session 10 – Advanced Process Control (APC)

Chairs: Agnes Roussy, École des Mines de Saint-Étienne; Vivek Jain, ASML; Raymond van Roijen, GLOBALFOUNDRIES
APC leverages the data collection capability of modern tools and infrastructure and uses advanced statistical techniques to predict product performance, detect excursions and enhance tool capability.

2:30 
10.1   Convergence Towards Large Perimeter Overlay Run-to-Run Using Multivariate APC System 
Benjamin Duclaux, Alice Pelletier, Jean De-Caunes, Robin Perrier, Laurène Babaud, Maxime Gatefait, Olivier Fagart, Nicolas Thivolle, Mathieu Guerabsi, Jean-Damien Chapon, Bruno Perrin, Cédric Monget, STMicroelectronics

2:55 
10.2   Advanced Process Controls of Underdetermined Systems of Feature Profiles in Semiconductor Manufacturing
Keung Hui, Leo Ke, SY Sheen, Taiwan Semiconductor Manufacturing Company

3:20
10.3  Coherence Analysis of Wafer Process Measurements from Chamber and Optical Emission Spectrum
Taikang Ning, Trinity College; CH Huang, V. Wong, J. Jensen, and H. Chan, Lam Research 

3:45
10.4  Providing Key Process Enabling Vacuum Capability Through Integrated Sub-Fab Data Management
Erik Collart, Michael Mooney, Luke Evason, Vincent Giorgi, David Hunt, Antonio Serapiglia, Alan Ifould, Edwards