Technic Announces the Release of TechniStrip® Micro D2

Technic Announces the Release of TechniStrip® Micro D2

Tuesday, Oct 23, 2018

Cranston, RI, USA – Technic has announced the release of TechniStrip® Micro D2, a specially developed nonhazardous replacement for N-methylpyrrolidone (NMP) - based photoresist strippers.

With increased concerns and regulations of NMP as a reprotoxin, Technic has developed a new photoresist stripper, free of NMP that achieves higher performance without an increase in cost. TechniStrip® Micro D2 is an environmentally friendly, non-hazardous solution of specially developed organic solvents with running costs similar to NMP-based strippers. TechniStrip® Micro D2 provides better dissolution and faster lift off in high volume production testing around the globe. TechniStrip® Micro D2 also provides greater metal and material compatibility, allowing it to be used on all stacks and particularly on sensitive materials such as III/V substrates.

TechniStrip® Micro D2 – New NMP-free Photoresist Stripper TechniStrip® Micro D2 is currently in mass production around the world and is used in a variety of applications including the removal of negative and positive tone resist, rework, and as a cleaner for adhesives and glues.

To learn more about TechniStrip® Micro D2, visit us online at Technic is a global supplier of advanced chemical solutions and controls for the semiconductor industry.

The company manufactures a complete line of cleaners, photoresist strippers and metal etchants under the names TechniClean, TechniStrip® , and TechniEtch. Technic also manufactures fabrication and packaging chemistry marketed under the Elevate® brand name.