Revising SEMI-E135 to Improve Testing Standards for RF Generators

Gas plasmas have become a fundamental building block in many semiconductor manufacturing processes. Plasma torches used to create these gas plasmas have three components: an induction coil, a plasma confinement tube, and a gas distributor or torch head that introduces multiple gases into the torch. RF generators supply the high-frequency electrical energy needed to transform the plasma-forming gases flowing through the torch, typically oxygen or a fluorine-bearing gas, into a plasma. The RF generators used for semiconductor manufacturing typically operate in the low megahertz or tens of megahertz frequency range and are expected to output high RF power at those frequencies for long periods. For example, ALD and CVD processes use RF generators with output powers on the order of a few kilowatts.